ONO 2000

Tutorial on Organic Nonlinear Optics

PDF Version

Optical wave manipulation is one of the future technologies for optical processing and communication. Organic nonlinear optical materials are thought to play a key role in these technologies, and a lot of effort to develop new molecules/materials as well as fundamental understanding is under way throughout the world. Prior to ICONO’5 in Davos (March 12-16, 2000), there will be a tutorial course at the Swiss Federal Institute of Technology (ETH-Hönggerberg) organized by the Nonlinear Optics Laboratory of the Institute of Quantum Electronics. The course will take place from Thursday, March 9, 9:00 until Saturday, March 11, 12:00. Lectures will be presented on Thursday and Friday by top lecturers from all over the world. On Saturday, March 11, 9:00-12:00 there will be a visit of the Nonlinear Optics Laboratory with demonstrations.

Tutorial course scope

Lecturers and Lectures

• PD Dr. Ch. Bosshard (ETH Zürich, Switzerland)
  Organic Crystals for Second-Order Nonlinear Optics
• Prof. Ch. Bubeck (MPI Mainz, Germany)
  Third-order Nonlinear Optics in Organic Materials
  Waveguide Devices Using Organic Materials
• Prof. L. Dalton (U. Southern California, USA)
  Electro-Optical Polymers
  Processing of Electro-optical Polymers Towards Photonic Applications
• Prof. T. Kaino (Tohoku U., Japan)
  Applications of Nonlinear Optical Crystals and Polymers
• Prof. S. Marder (U. Arizona, USA)
  Organic Molecules for Nonlinear Optics
  Two-photon Absorption in Organic Materials
• Prof. N. Peyghambarian (U. Arizona, USA)
  Time-resolved Studies of Nonlinear Optical Materials
  Organic Light Emitting Diodes
• Prof. R. Shen (UC Berkeley, USA)
  Nonlinear Optical Phenomena
  Investigation of Surfaces by Nonlinear Optical Techniques
• Prof. X.-C. Zhang (Rensselaer Polytechnic Institute, USA)
  Introduction to THz Waves
  Application of THz Waves
• Prof. J. Zyss (Ecole Normale Supérieure de Cachan, France)
  Organic Nonlinear Optical Materials: Theoretical Aspects
  Organic Materials for Optical Device Applications
  

Schedule

	Thursday March 9	Friday March 10	Saturday March 11
8.00 - 9.00	Registration	Registration
9.00 - 9.45 9.45 - 10.30	Chairman: P. Günter Ch. Bosshard Ch. Bubeck	Chairman: Ch. Bosshard R. Shen S. Marder	9.00 - 12.00 Laboratory Visit HPF G6
10.30 - 11.00	Coffee Break	Coffee Break
11.00 - 11.45 11.45 - 12.30	Chairman: Ch. Bubeck J. Zyss L. Dalton	Chairman: S. Marder N. Peyghambarian X.C. Zhang
12.30 - 14.00	Lunch	Lunch
14.00 - 14.45 14.45 - 15.30	Chairman: L. Dalton T. Kaino Ch. Bubeck	Chairman: R. Shen J. Zyss S. Marder
15.30 - 16.00	Coffee Break	Coffee Break
16.00 - 16.45 16.45 - 17.30	Chairman: T. Kaino L. Dalton X.C. Zhang	Chairman: J. Zyss R. Shen N. Peyghambarian
17.30 - 19.00	Reception

Registration

Participants are asked to register before January 30, 2000. Please complete the PDF registration form and send or fax it to the course secretariat.

Hotel accommodation

The course organizers have reserved a small block of hotel rooms in downtown Zürich for a special course rate of CHF135 /day (single room including breakfast). These rooms are reserved on a first come, first served basis.

Registration fees

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